Linbo3 dry etch
Nettet20. mar. 2024 · Si Etching (Fluorine ICP Etcher) SiVertHF - Si Vertical Etch using C 4 F 8 /SF 6 /CF 4 and resist mask . Etch Rates: Si ≈ 300-350 nm/min; SiO 2 ≈ 30-35 nm/min; … NettetAbstract: In this letter, we report ridge waveguides fabricated on X-cut proton exchange (PE)-LiNbO3 using inductively coupled plasma (ICP) etching techniques. Various …
Linbo3 dry etch
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Nettet2. aug. 2024 · Then, the standard dry-etching process by using the inductively coupled plasma-reactive ion etching (ICP-RIE) tools was employed (by SPTS DRIE-I), to etch the a-Si hard mask by the SF 6 and C 4 F 8 mixed gases, and the residual resist was removed by wet etching with the acetone solutions, and then the sample was treated with the … Nettet1. aug. 2011 · Several etching techniques have been demonstrated so far for the fabrication of ridges waveguides in LiNbO3, such as plasma dry etching [1] or wet etching [2]. In particular, ion-beam enhanced etching has demonstrated to be an excellent choice to fabricate structures with high aspect ratios in lithium niobate [3].
NettetHere, we report our recent progress in etching different crystalline LN substrates using Inductively Coupled Plasma (ICP). By comparing different combinations of the mask materials on different LN orientations (cuts), we present optimal dry etch conditions to obtain deep etching profiles on all orientations with smooth and vertical sidewalls. LN Nettet12. feb. 2008 · The etching characteristics of congruent LiNbO 3 single crystals including doped LiNbO 3 and proton-changed LiNbO 3 have been studied in reactive ion …
Nettet1. jan. 2012 · In this study, the interactions of wet etching condition with the Cr hard mask were investigated in terms of the process impact to the mask wall angle. The chemical reaction was studied and discussed here in term of mass transportation condition. XPS revealed that the etch byproduct was Cr nitrate (Cr(NO3)3) and Cr oxide (Cr2O3). Nettet1. okt. 2024 · Fig. 1 (a) and (b) shows the configuration of the cosine-shaped Y-branch optical waveguide and the straight optical waveguide used in this paper. In our design, top width W of the cosine-shaped Y-branch waveguide and straight waveguide is set to be 3 μm and 800 nm, respectively. And in order to improve the coupling efficiency, the input …
Nettet12. feb. 2008 · Various approaches were used for sub micrometer structuring in LiNbO 3 , such as dry etching using ion beam etching (IBE), reactive ion etching (RIE) and …
NettetHI, Paul, We in CNS evaluated different chambers and ICP systems for LiNbO3 etching, and it turned out Ulvac ICP NLD-570 gave us better results. Instead of fluorine, we just used Ar (physical sputtering). Redeposition is always an issue for LiNbO3 etching, and it is critical to tune the power, pressure and temperature. technet camera driverNettetDe Gruyter technet cameraNettetThe exceptional material properties of Lithium Niobate (LiNbO3) make it an excellent material platform for a wide range of RF, MEMS, phononic and photonic applications; … technet communityNettet3. des. 2024 · Abstract: This work is an extensive study of the plasma chemical etching (PCE) process of single-crystalline lithium niobate (LiNbO 3) in the SF 6 /O 2 based … spartanburg county jail birdsNettet1. feb. 2006 · The Ni metal with 1.2 μm thickness deposited on a LiNbO 3 wafer was etched as a dry etching mask to have patterns with 15 μm width by the photolithography method. The LiNbO 3 etching rate, sidewall roughness and mask etch rate were measured by SEM (Philips, XL-30 FEG/ESEM). Also etched surface roughness was … spartanburg county jail roster scNettet1. aug. 2024 · Dry lithiation of the WO 3 film was performed by exposing the film in vacuum to Li vapor atoms, which are given off by RF magnetron sputtering of LiNbO 3. An all … technet cat6 testerNettet1. des. 2006 · A plasma dry etching technique was applied to the fabrication of ridge-shaped LiNbO3 optical waveguides for broadband operation. The etching … technet card